POLISHING SLURRY FOR THE CHEMICAL-MECHANICAL POLISHING OF SILICA FILMS
1148/MUM/2001 A (1148/MUM/2001)
Filed on 2001-11-29
Publication date 2006-10-27
A polishing slurry for chemical-mechanical polishing, containing 5 to 50% by weight of a colloidal silica abrasive, and 0.1 to 10% by weight of a quaternary ammonium salt which is represented by the formula R4N+X, where R may be identical or different and is selected from the group consisting of alkyl, alkenyl, alkylaryl, arylalkyl and an ester group, an X is hydroxyl or halogen, is distinguished by high polishing rate. Figure Sheets. NIL Total Pages: 11 (FIG.NIL)
Applicant
BAYER AKTIENGESELLSCHAFT Address of the Applicant: D 51368 LEVERKUSEN, GERMANY
International Information
Classification
C09G 1/02, C09G 1/04, C09K 3/14
Publication number
NIL