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A system and corresponding methods for purifying and removing contaminants from gaseous fluids includes a housing including an inlet, an outlet, and an elongated UV chamber disposed within the housing. The UV radiation source is disposed longitudinally within the UV chamber. At least one baffle structure is disposed at an upstream location within the housing to restrict flow as well as to generate a turbulent flow of the gaseous fluid within the UV chamber. In addition, a fan is disposed at a selected location within the housing to facilitate a flow of the gaseous fluid through the housing at a selected flow rate. The dimensions of the UV chamber and UV source and the configuration of the baffle structure are selected to increase the exposure time and mixing of fluid flowing through the UV chamber as well as increase the proximity of the flowing fluid to the UV source. (FIG. 1)