A MAGNETRON SPUTTERING DEVICE, A CYLINDRICAL CATHODE AND A METHOD OF COATING THIN MULTICOMPONENT FILMS ON A SUBSTRATE
Application 1453/DEL/2005 published 2006-12-01, filed 2005-06-06
The invention relates to a magnetron sputtering device particularly comprising at least one vacuum and being intended for the coating of multicomponent films on a substrate by means of magnetron co-sputtering; said device is provided with a cylindrical cathode (1,1â¼ mounted rotatably around the axial longitudinal shaft and is further provided with a magnetic system arranged inside the cylindrical cathode (1,1â¼ 7KHF\OLQGULFDOFDWKRGH k¼ LQFOXGHVDWOHDVWWZRVHJPHQWV k¼k¼k¼k¼ KDYLQJGLIIHUHQWtarget materials. In addition, the invention relates to a method of coating multicomponent films on a substrate by way of magnetron co-sputtering in a vacuum coating system.
Applicant
1)APPLIED FILMS GMBH & CO. KG,
:SIEMENSSTRASSE 100, 63755 ALZENAU, GERMANY, Germany
Inventor
1)MICHAEL LIEHR
International Info
Classification: C23C14/00
Priority Information
04 018 926.8 EUROPEAN UNION 2004-08-10