A COMPOSITION OF ANIONIC PHOTOCATALYST AND POLYMERIZABLE MATERIAL.
Application 882/CHE/2004 published 2006-06-09, filed 2004-09-01
The present invention relates to a composition comprising: poylmerizable material and an anionic photocatalyst, characterized in that the anionic photocatalyst is a photo labile compound able to liberate a strong base having a pKa > 12 and has the structural formula: Z-A wherein Z is a photolabile group, A is a strong base and Z is covalently bound to A.
Applicant
CIBA SPECIALTY CHEMICALS HOLDING INC.
Klybeckstrasse 141, CH-4057 Basel ,, SWITZERLAND.
Inventor
International Info
Classification: C 08 F 2/50 , G 03 F 7/04
Publication Number:
Priority Information
96200466.9 EUROPE. 1996-02-22