POWER COUPLING FOR HIGH-POWER SPUTTERING
Application 1237/MUM/2004 published 2006-06-09, filed 2004-11-17
A system method for coating a substrate is described. One embodiment includes a high-power sputtering system with a power coupler configured to deliver power to a rotatable target. The power coupler is positioned in a vacuum chamber or between the bearings and the rotatable target outside the vacuum chamber to limit the current that flows through the bearing. Drawing: 11 Sheets. Total Pages: 25. Fig. Nil
Applicant
1. APPLIED FILMS CORPORATION 2. APPLIED FILMS GMBH & CO.KG.
1. 9586 I-25 FRONTAGE ROAD, LONGMONT, COLORADO 80504, U.S.A. 2. SIEMENSSTRASSE 100 D-63755 ALZENAU, GERMANY.
Inventor
1. NEWCOMB RICHARD 2. GEISLER MICHAEL
International Info
Classification: C23C 14/34, H01J 37/34, C23C 14/34
Priority Information
10/820,896 U.S.A. 2004-04-08