BigPatents India

A process of spraying a solution of a desired precursor salt continuously by an atomizer (nozzle), which converts solution into fine droplets, onto preheated substrates wherein the said salt undergoes pyrolytic decomposition leading to the formation of thin film coating of a desired semiconducting material onto the said substrate, characterized in that an apparatus is modified to obtain an intermittent spray of an aqueous or noaqueous solution, prepared by dissolving an appropriate quantity of said salt, usually metal chlorides, nitrates, sulfates and acetates, into the solvents like methanol, ethanol, propanol, distilled water, using microprocessor controlled electromagnetic solenoids, onto the substrates heated at temperature within the range 200ºC to 800ºC at optimized conditions of nozzle to substrate distance, concentration and quantity of the said solution, solution and gas flow rates, wherein solution is siphoned by nozzle either downwards or upwards in presence of adequate ambient resulting in the process similar to chemical vapour deposition having ability to improve quality of the thin film coating. Drawing: 01 Sheets. Total Pages: 27. Fig. Nil