"APPARATUS AND PROCESS FOR SENSING FLUORO SPECIES IN SEMICONDUCTOR PROCESSING SYSTEMS"
Application 1402/DELNP/2005 published 2007-01-19, filed 2005-04-07
A gas ditector (54) and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element (8) that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/device package (6) so that the package becomes a platform of the detector.
Applicant
1)ADVANCED TECHNOLOGY MATERIALS, INC.,
:7 COMMERCE DRIVE, DANBURY, CONNECTICUT 06810, U.S.A U.S.A.
Inventor
1)FRANK DIMEO 2)PHILIP S.H. CHEN, 3)JEFFREY W, NEUNER 4)JAMES WELCH 5)MICHELE STAWASZ 6)THOMAS H. BAUM 7)MACKENZIE E. KING 8)ING-SHIN CHEN 9)JEFFREY F. ROEDER
International Info
Classification: G01N 9/00
Publication Number: WO 2004/036175
Application Date: 2003-10-15
Priority Information
10/273,036 U.S.A. 2002-10-17