: “SILICON NITRIDE-BONDED SiC REFRACTORY MATERIAL AND METHOD FOR PRODUCTION THEREOF”

Application 383/KOLNP/2006 published 2007-03-30, filed 2006-02-21
The present invention provides a silicon nitride-bonded SiC refractory which contains SiC as a main phase and Si3N4 and /or Si2N2O as a secondary phase and which has a bending strength of 150 to 300 MPa and a bulk density of 2.6 to 2.9, and a method for producing a silicon nitride-bonded SiC refractory, which comprises a step of mixing 30 to 70% by ;mass of a SiC powder of 30 to 300 µm as an aggregate, 10 to 50% by mass of a SiC powder of 0.05 to 30 µm, 10 to 30% by mass of a Si powder of 0.05 to 30 µm, and 0.1 to 3% by mass, in terms of oxide, of at least one member selected from the group consisting of Al, Ca, Fe, Ti, Zr and Mg. According to the silicon nitride-bonded SiC refractory ;and the method for production thereof, there can be obtained a refractory which has heat resistance, thermal shock resistance and oxidation resistance and which is high in strength and superior in creep resistance ;and thermal conductivity. (FIG. nil)

Applicant

1. NGK INSULATORS, LTD 2. NGK ADREC CO., LTD.
1. 2-56, SUDA-CHO, MIZUHO-KU, NAGOYA-CITY, AICHI-PREFECTURE, 467-8530 JAPAN 2. 3040,MISANO, MITAKE-CHO, KANI-GUN, GIFU-PREFECTURE, 505-0112 JAPAN

Inventor

1. KINOSHITA TOSHIHARU 2. 2. KOMIYAMA TSUNEO

International Info

Classification: C04B 35/577
Publication Number: WO 2005/026076 A1
Application Date: 2004-07-23

Priority Information

2003-317022 JAPAN 2003-09-09