MEMBER FOR SEMICONDUCTOR DEVICE AND PRODUCTION METHOD THEREOF
Application 4901/DELNP/2007 published 2007-08-17, filed 2007-06-25
A member for a semiconductor device of low price, capable of forming a high quality plating layer on a surface, having heat conductivity at high temperature (100°C) of more than or equal to 180 W/m.K and toughness that will not cause breaking due to screwing, and will not cause solder breaking due to heat stress when it is bonded to other member with solder, and a production method thereof are provided. A member for a semiconductor device (l) having a coefficient of thermal expansion ranging from 6.5 x 10-6/K to 15 x 10-6/K inclusive, and heat conductivity at 100°C of more than or equal to 180 W/m.K, has: a base material (11) formed of an aluminum-silicon carbide composite material starting from powder material in which particulate silicon carbide is dispersed in aluminum or aluminum alloy, and the content of the silicon carbide is from 30% by mass to 85% by mass inclusive; and a superficial layer (12) containing aluminum or aluminum alloy starting from a melt material bonded on top and bottom faces of the base material (11).
Applicant
1)A. L. M. T. CORP.
:11-11, SHIBA 1-CHOME, MINATO-KU, TOKYO 105-0014 JAPAN. Japan
Inventor
1)AKIRA FUKUI
International Info
Classification: H01L 23/373
Publication Number: WO 2006/077755
Application Date: 2006-01-11
Priority Information
2005-012221 Japan 2005-01-20